Postdoctoral Research Associate - EUV Patterning Materials

The Center for Functional Nanomaterials (CFN) at Brookhaven is a DOE-funded national scientific user facility, offering users a supported research experience with top-caliber scientists and access to state-of-the- art instrumentation. The CFN mission is advancing nanoscience through frontier fundamental research and technique development and is the nexus of a broad collaboration network. Each year, CFN staff members support the research of nearly 600 external facility users.

Three strategic nanoscience themes underlie the CFN scientific facilities: The CFN conducts research on nanomaterial synthesis by assembly designing precise architectures with targeted functionality by organizing nanoscale components. The CFN researches and applies platforms for state-of-the-art techniques for Accelerated Nanomaterial Discovery, integrating synthesis, advanced characterization, physical modeling, and computer science to iteratively explore a wide range of material parameters. The CFN develops and utilizes advanced capabilities for studies of Nanomaterials in Operando Conditions for characterizing materials and reactions at the atomic scale in real-world environments.

The CFN is seeking a talented Postdoctoral Research Associate to conduct research on developing novel hybrid photoresist materials for extreme ultraviolet (EUV) lithography by synthesizing organic-inorganic hybrid thin films via atomic layer deposition (ALD) techniques, especially vapor-phase infiltration (VPI). You will explore the materials chemistry, EUV exposure mechanisms, high-resolution patterning performance, and dry-etching characteristics of the synthesized hybrid resists by utilizing electron beam lithography (EBL), low-energy electron exposure, infrared (IR) spectroscopy, and EUV lithography. This work is part of a larger effort to design photoresist materials for the next-generation EUV lithography for Angstrom-era semiconductor chip manufacturing. You will work under the supervision of Dr. Chang-Yong Nam (Electronic Nanomaterials Group).

• You will synthesize and characterize organic-inorganic hybrid thin films applicable to EBL and EUV lithography by leveraging ALD techniques including VPI.

• You will perform in-depth materials characterization on organic-inorganic hybrid resists and measure their EBL & EUV lithography patterning as well as dry etching characteristics as a function of synthesis parameters and materials composition.

• You will explore new material compositions, EUV exposure mechanisms, and EUV photochemistry for improving the performance of vapor-synthesized hybrid EUV photoresists.

• You will collaborate with scientific staff with diverse backgrounds including materials science & chemistry, nanofabrication, and advanced characterizations including those based on synchrotron beamline techniques.

• You will disseminate research findings via paper publications and external presentations.

• You have a Ph.D. in a relevant discipline (Materials Science, Chemical Engineering, Chemistry, or a related engineering discipline), conferred within the past five years or to be completed prior to the starting date.

• You have demonstrated experimental expertise in the synthesis of organic-inorganic hybrid thin films using ALD techniques, including VPI, and their characterization using low-energy electron microscopy (LEEM)/X-ray photoemission electron microscopy (XPEEM), EBL & EUV lithography, atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), inductively-coupled plasma reactive ion etching (ICP-RIE), and other characterization methods including transmission electron microscopy (TEM).

• You have demonstrated experimental experience in nanofabrication processes (e.g., EBL, physical vapor deposition, ALD etc.) and critical dimension (CD) measurements & analysis using scanning electron microscopy (SEM) and CD analysis software.

• You communicate effectively, verbally and in writing, evidenced by peer-reviewed publications and conference presentations/proceedings.

• You are committed to creative and independent research, teamwork, and fostering an environment of safe scientific work practices.

• You have hands-on experimental experience with applying VPI-based hybridization using various organic templates, including but not limited to self-assembled block copolymer thin films, lithographically patterned polymer structures, and other exotic templates.

• You have experience in performing EUV patterning using shifts for the Micro Exposure Tool 5 (MET5)-a 0.55 NA EUV lithography patterning beamline-at Advanced Light Source of the Lawrence Berkeley National Laboraotry.

• You have experience in optimizing the patterning performance of hybrid resists by engineering materials chemistry and lithography patterning process parameters.

• You have experience or working knowledge of the synthesis of organic-inorganic hybrid thin films using molecular layer deposition (MLD).

• You have experience in materials characterization and analysis relevant for organic-inorganic hybrid thin films, including but not limited to ellipsometry, X-ray scattering, X-ray reflectivity, and IR spectroscopy.

• This is a 2-year Postdoc Assignment.

• BNL policy requires that after obtaining a PhD, eligible candidates for research associate appointments may not exceed a combined total of 5 years of relevant work experience as a post- doc and/or in an R&D position, excluding time associated with family planning, military service, illness, or other life-changing events.

Brookhaven Laboratory is committed to providing fair, equitable and competitive compensation. The full salary range for this position is $71900 - $80000 / year. Salary offers will be commensurate with the final candidate's qualification, education and experience and considered with the internal peer group