Sr Technician (I.C.) 3rd Shift
MIT Lincoln Laboratory | |
tuition reimbursement, 401(k) | |
United States, Massachusetts, Lexington | |
244 Wood Street (Show on map) | |
Sep 19, 2024 | |
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Apply now Date: Sep 19, 2024 Location: Company: Job Description
Candidate will work in the class 10 clean room of the Microelectronics Laboratory supporting a broad range of activities in the Advanced Technology Division manufacturing deep submicron devices, charge-coupled devices, and micro mechanical structures. Primary responsibility will be to monitor, prioritize, and process all work in progress within a specific process area and to provide clear and accurate inter-shift pass-down of such work. The goal of this position is to produce completed wafers with excellent quality and low cycle time. Additional responsibilities shall include but not be limited to: Perform SPC tasks and monitor and respond appropriately to data, interface with engineering and Program Originators on research projects and support the development of new processes and/or routine maintenance as required. Qualifications required of applicant:
Experience:
Skills:
At MIT Lincoln Laboratory, our exceptional career opportunities include many outstanding benefits to help you stay healthy, feel supported, and enjoy a fulfilling work-life balance. Benefits offered to employees include:
Please visit our Benefits page for more information. As an employee of MIT, you can also take advantage ofother voluntary benefits, discounts and perks. Selected candidate will be subject to a pre-employment background investigation and must be able to obtain and maintain a Secret level DoD security clearance. MIT Lincoln Laboratory is an Equal Employment Opportunity (EEO) employer. All qualified applicants will receive consideration for employment and will not be discriminated against on the basis of race, color, religion, sex, sexual orientation, gender identity, national origin, age, veteran status, disability status, or genetic information; U.S. citizenship is required. Requisition ID: 41419
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